Lin Nan, previously head of light source technology at ASML drives latest EUV breakthrough from China 林楠，曾任 ASML 光源技術負責人，推動 中國EUV 最新突破

The team, from the Chinese Academy of Sciences’ Shanghai Institute of Optics and Fine Mechanics, was led by Lin Nan, previously head of light source technology at ASML in the Netherlands. 該團隊來自中國科學院上海光學精密機械研究所，由曾任荷蘭ASML公司光源技術負責人的林楠領導.

Chinese researchers have cracked a barrier to the home-grown production of advanced chips by building an extreme ultraviolet (EUV) light source platform that operates at internationally competitive parameters, according to a research paper. 一份研究論文稱，中國研究人員透過建構一個以國際競爭參數運作的極紫外線 (EUV) 光源平台，突破了國產先進晶片的障礙.